Pseudo-Single-Nucleus Lateral Crystallization of Si Thin Films
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Veröffentlicht in: | Japanese Journal of Applied Physics 2008-03, Vol.47 (3S), p.1862 |
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container_issue | 3S |
container_start_page | 1862 |
container_title | Japanese Journal of Applied Physics |
container_volume | 47 |
creator | Endo, Takahiko Taniguchi, Yukio Katou, Tomoya Shimoto, Shigeyuki Ohno, Takashi Azuma, Kazufumi Matsumura, Masakiyo |
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doi_str_mv | 10.1143/JJAP.47.1862 |
format | Article |
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ispartof | Japanese Journal of Applied Physics, 2008-03, Vol.47 (3S), p.1862 |
issn | 0021-4922 1347-4065 |
language | eng |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
title | Pseudo-Single-Nucleus Lateral Crystallization of Si Thin Films |
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