Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

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Veröffentlicht in:Japanese Journal of Applied Physics 2007-09, Vol.46 (9S), p.6113
Hauptverfasser: Kinoshita, Hiroo, Hamamoto, Kazuhiro, Sakaya, Nobuyuki, Hosoya, Morio, Watanabe, Takeo
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container_end_page
container_issue 9S
container_start_page 6113
container_title Japanese Journal of Applied Physics
container_volume 46
creator Kinoshita, Hiroo
Hamamoto, Kazuhiro
Sakaya, Nobuyuki
Hosoya, Morio
Watanabe, Takeo
description
doi_str_mv 10.1143/JJAP.46.6113
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_46_6113</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_46_6113</sourcerecordid><originalsourceid>FETCH-LOGICAL-c301t-50f80ee206fec47024eb688e3e78a76bb439ebccaa405723a5fa312bdae7fdcb3</originalsourceid><addsrcrecordid>eNot0M1Og0AYheGJ0USs7ryAuQDB-WOgS9LUlgajiXZNPqbftCgUMjMxcvdKdHXybs7iIeSes4RzJR93u-I1UTrRnMsLEnGpslgxnV6SiDHBY7UU4prceP_xmzpVPCKbAl0LHS17OCJ9Bv9Jy7Mf0YR2ONO3yQfsqR0cXX8Hhz3SfRccfLVDh4FWbTgNRwfjabolVxY6j3f_uyD7p_X7ahtXL5tyVVSxkYyHOGU2Z4iCaYtGZUwobHSeo8Qsh0w3jZJLbIwBUCzNhITUguSiOQBm9mAauSAPf7_GDd47tPXo2h7cVHNWzwj1jFArXc8I8geKllCU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Kinoshita, Hiroo ; Hamamoto, Kazuhiro ; Sakaya, Nobuyuki ; Hosoya, Morio ; Watanabe, Takeo</creator><creatorcontrib>Kinoshita, Hiroo ; Hamamoto, Kazuhiro ; Sakaya, Nobuyuki ; Hosoya, Morio ; Watanabe, Takeo</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.46.6113</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2007-09, Vol.46 (9S), p.6113</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c301t-50f80ee206fec47024eb688e3e78a76bb439ebccaa405723a5fa312bdae7fdcb3</citedby><cites>FETCH-LOGICAL-c301t-50f80ee206fec47024eb688e3e78a76bb439ebccaa405723a5fa312bdae7fdcb3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kinoshita, Hiroo</creatorcontrib><creatorcontrib>Hamamoto, Kazuhiro</creatorcontrib><creatorcontrib>Sakaya, Nobuyuki</creatorcontrib><creatorcontrib>Hosoya, Morio</creatorcontrib><creatorcontrib>Watanabe, Takeo</creatorcontrib><title>Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography</title><title>Japanese Journal of Applied Physics</title><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNot0M1Og0AYheGJ0USs7ryAuQDB-WOgS9LUlgajiXZNPqbftCgUMjMxcvdKdHXybs7iIeSes4RzJR93u-I1UTrRnMsLEnGpslgxnV6SiDHBY7UU4prceP_xmzpVPCKbAl0LHS17OCJ9Bv9Jy7Mf0YR2ONO3yQfsqR0cXX8Hhz3SfRccfLVDh4FWbTgNRwfjabolVxY6j3f_uyD7p_X7ahtXL5tyVVSxkYyHOGU2Z4iCaYtGZUwobHSeo8Qsh0w3jZJLbIwBUCzNhITUguSiOQBm9mAauSAPf7_GDd47tPXo2h7cVHNWzwj1jFArXc8I8geKllCU</recordid><startdate>20070901</startdate><enddate>20070901</enddate><creator>Kinoshita, Hiroo</creator><creator>Hamamoto, Kazuhiro</creator><creator>Sakaya, Nobuyuki</creator><creator>Hosoya, Morio</creator><creator>Watanabe, Takeo</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20070901</creationdate><title>Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography</title><author>Kinoshita, Hiroo ; Hamamoto, Kazuhiro ; Sakaya, Nobuyuki ; Hosoya, Morio ; Watanabe, Takeo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c301t-50f80ee206fec47024eb688e3e78a76bb439ebccaa405723a5fa312bdae7fdcb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kinoshita, Hiroo</creatorcontrib><creatorcontrib>Hamamoto, Kazuhiro</creatorcontrib><creatorcontrib>Sakaya, Nobuyuki</creatorcontrib><creatorcontrib>Hosoya, Morio</creatorcontrib><creatorcontrib>Watanabe, Takeo</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kinoshita, Hiroo</au><au>Hamamoto, Kazuhiro</au><au>Sakaya, Nobuyuki</au><au>Hosoya, Morio</au><au>Watanabe, Takeo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2007-09-01</date><risdate>2007</risdate><volume>46</volume><issue>9S</issue><spage>6113</spage><pages>6113-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.1143/JJAP.46.6113</doi></addata></record>
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1347-4065
language eng
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T02%3A13%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Aerial%20Image%20Mask%20Inspection%20System%20for%20Extreme%20Ultraviolet%20Lithography&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Kinoshita,%20Hiroo&rft.date=2007-09-01&rft.volume=46&rft.issue=9S&rft.spage=6113&rft.pages=6113-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.46.6113&rft_dat=%3Ccrossref%3E10_1143_JJAP_46_6113%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true