Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor

Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Japanese Journal of Applied Physics 2007-07, Vol.46 (7R), p.4085
Hauptverfasser: Cho, Seungchan, Lee, Keunwoo, Song, Pungkeun, Jeon, Hyeongtag, Kim, Yangdo
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 7R
container_start_page 4085
container_title Japanese Journal of Applied Physics
container_volume 46
creator Cho, Seungchan
Lee, Keunwoo
Song, Pungkeun
Jeon, Hyeongtag
Kim, Yangdo
description
doi_str_mv 10.1143/JJAP.46.4085
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_46_4085</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_46_4085</sourcerecordid><originalsourceid>FETCH-LOGICAL-c326t-a7d79ae7c15585cef606631d4fac1f67a12776e117f37cdda4fca12e5387fef53</originalsourceid><addsrcrecordid>eNotkM9OAjEYxBujiYjefIAeNXFxu_0HR0RQCVFi4OJl89n9KtXdLWnLYX0KH1mIniYzk5nDj5BLlg8YE_x2Ph8vB0INRD6UR6THuNCZyJU8Jr08L1gmRkVxSs5i_NxbJQXrkZ87CMFhoJMNBDAJg4vJmUi9pW_hmc5c3UR6j1sfXcKKvnf0FRufkC5riA1k03YDrdk34-QbZ-gCuv3b_8D5lq6jaz_oClOALxevKodp09XQuNZff7tgfOt2DV0GNLsQfTgnJxbqiBf_2ifr2XQ1ecwWLw9Pk_EiM7xQKQNd6RGgNkzKoTRoVa4UZ5WwYJhVGlihtULGtOXaVBUIa_YZSj7UFq3kfXLz92uCjzGgLbfBNRC6kuXlgWZ5oFkKVR5o8l9dj2uu</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor</title><source>Institute of Physics Journals</source><creator>Cho, Seungchan ; Lee, Keunwoo ; Song, Pungkeun ; Jeon, Hyeongtag ; Kim, Yangdo</creator><creatorcontrib>Cho, Seungchan ; Lee, Keunwoo ; Song, Pungkeun ; Jeon, Hyeongtag ; Kim, Yangdo</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.46.4085</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2007-07, Vol.46 (7R), p.4085</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c326t-a7d79ae7c15585cef606631d4fac1f67a12776e117f37cdda4fca12e5387fef53</citedby><cites>FETCH-LOGICAL-c326t-a7d79ae7c15585cef606631d4fac1f67a12776e117f37cdda4fca12e5387fef53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Cho, Seungchan</creatorcontrib><creatorcontrib>Lee, Keunwoo</creatorcontrib><creatorcontrib>Song, Pungkeun</creatorcontrib><creatorcontrib>Jeon, Hyeongtag</creatorcontrib><creatorcontrib>Kim, Yangdo</creatorcontrib><title>Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor</title><title>Japanese Journal of Applied Physics</title><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNotkM9OAjEYxBujiYjefIAeNXFxu_0HR0RQCVFi4OJl89n9KtXdLWnLYX0KH1mIniYzk5nDj5BLlg8YE_x2Ph8vB0INRD6UR6THuNCZyJU8Jr08L1gmRkVxSs5i_NxbJQXrkZ87CMFhoJMNBDAJg4vJmUi9pW_hmc5c3UR6j1sfXcKKvnf0FRufkC5riA1k03YDrdk34-QbZ-gCuv3b_8D5lq6jaz_oClOALxevKodp09XQuNZff7tgfOt2DV0GNLsQfTgnJxbqiBf_2ifr2XQ1ecwWLw9Pk_EiM7xQKQNd6RGgNkzKoTRoVa4UZ5WwYJhVGlihtULGtOXaVBUIa_YZSj7UFq3kfXLz92uCjzGgLbfBNRC6kuXlgWZ5oFkKVR5o8l9dj2uu</recordid><startdate>20070701</startdate><enddate>20070701</enddate><creator>Cho, Seungchan</creator><creator>Lee, Keunwoo</creator><creator>Song, Pungkeun</creator><creator>Jeon, Hyeongtag</creator><creator>Kim, Yangdo</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20070701</creationdate><title>Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor</title><author>Cho, Seungchan ; Lee, Keunwoo ; Song, Pungkeun ; Jeon, Hyeongtag ; Kim, Yangdo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c326t-a7d79ae7c15585cef606631d4fac1f67a12776e117f37cdda4fca12e5387fef53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Cho, Seungchan</creatorcontrib><creatorcontrib>Lee, Keunwoo</creatorcontrib><creatorcontrib>Song, Pungkeun</creatorcontrib><creatorcontrib>Jeon, Hyeongtag</creatorcontrib><creatorcontrib>Kim, Yangdo</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Cho, Seungchan</au><au>Lee, Keunwoo</au><au>Song, Pungkeun</au><au>Jeon, Hyeongtag</au><au>Kim, Yangdo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2007-07-01</date><risdate>2007</risdate><volume>46</volume><issue>7R</issue><spage>4085</spage><pages>4085-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.1143/JJAP.46.4085</doi></addata></record>
fulltext fulltext
identifier ISSN: 0021-4922
ispartof Japanese Journal of Applied Physics, 2007-07, Vol.46 (7R), p.4085
issn 0021-4922
1347-4065
language eng
recordid cdi_crossref_primary_10_1143_JJAP_46_4085
source Institute of Physics Journals
title Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T00%3A49%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Barrier%20Characteristics%20of%20ZrN%20Films%20Deposited%20by%20Remote%20Plasma-Enhanced%20Atomic%20Layer%20Deposition%20Using%20Tetrakis(diethylamino)zirconium%20Precursor&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Cho,%20Seungchan&rft.date=2007-07-01&rft.volume=46&rft.issue=7R&rft.spage=4085&rft.pages=4085-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.46.4085&rft_dat=%3Ccrossref%3E10_1143_JJAP_46_4085%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true