Experimental Study on Favorable Properties of Compound RF Discharge Plasmas with a Tapered Shape Hollow Cathode Compared with a Plane Cathode

Experimental Study on Favorable Properties of Compound RF Discharge Plasmas with a Tapered Shape Hollow Cathode Compared with a Plane Cathode

An experimental investigation on the characteristics of compound RF discharge plasmas with a tapered shape hollow-cathode (HC) compared with a plane cathode is presented for the development of processing plasma. Dense plasmas are shown to be generated in the wide range of working pressures, 3< p

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Veröffentlicht in:Japanese Journal of Applied Physics 2006-11, Vol.45 (11R), p.8883
Hauptverfasser: Yambe, Kiyoyuki, Matsuoka, Akio, Kondoh, Yoshiomi
Format: Artikel
Sprache:eng
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Zusammenfassung:An experimental investigation on the characteristics of compound RF discharge plasmas with a tapered shape hollow-cathode (HC) compared with a plane cathode is presented for the development of processing plasma. Dense plasmas are shown to be generated in the wide range of working pressures, 3< p
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.45.8883