Film Structures and Electrical Properties of Pr Silicate Formed by Pulsed Laser Deposition
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Veröffentlicht in: | Japanese Journal of Applied Physics 2006-04, Vol.45 (4S), p.2903 |
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container_issue | 4S |
container_start_page | 2903 |
container_title | Japanese Journal of Applied Physics |
container_volume | 45 |
creator | Ariyoshi, Keiko Sakashita, Mitsuo Sakai, Akira Ogawa, Masaki Zaima, Shigeaki |
description | |
doi_str_mv | 10.1143/JJAP.45.2903 |
format | Article |
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ispartof | Japanese Journal of Applied Physics, 2006-04, Vol.45 (4S), p.2903 |
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language | eng |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
title | Film Structures and Electrical Properties of Pr Silicate Formed by Pulsed Laser Deposition |
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