Technology for Fabrication of Nanostructures by Standard Cleanroom Processing and Nanoimprint Lithography

Sub-micron structures are routinely fabricated by electron beam lithography (EBL). However EBL is a time consuming and costly technology. We present a technology for fabrication of nanostructures by standard UV-lithography and thermal nanoimprint lithography (NIL). NIL-stamps with sub-30 nm patterns...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2005-07, Vol.44 (7S), p.5606
Hauptverfasser:	Bilenberg, Brian, Jacobsen, Søren, Pastore, Carine, Nielsen, Theodor, Enghoff, Simon Riis, Jeppesen, Claus, Larsen, Asger Vig, Kristensen, Anders
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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