Actinic Mask Inspection Using an EUV Microscope –Preparation of a Mirau Interferometer for Phase-Defect Detection

This paper describes a mask defect inspection system using 13.5 nm light for extreme ultraviolet lithography (EUVL). The Schwarzschild optics which is employed as a microscope optics has a numerical aperture (NA) of 0.3 and a magnification of 30. Furthermore, it has a potential of detecting defects...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2005-07, Vol.44 (7S), p.5474
Hauptverfasser:	Hamamoto, Kazuhiro, Tanaka, Yuzuru, Kawashima, Hirotake, Lee, Seung Yoon, Hosokawa, Nobuyuki, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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