Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O 3 Thin Films on Structural Stabilities of Hybrid Pt/IrO 2 /Ir Stack and Single-Layer Ir Bottom Electrodes
High-temperature Pb(Zr,Ti)O 3 (PZT) metal-organic chemical vapor deposition (MOCVD) at 620°C was performed on two major bottom electrode candidates, namely, a hybrid Pt/IrO 2 /Ir stack electrode and a single-layer Ir electrode. The structural stabilities of both PZT/electrode stacks were investigate...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 2004-05, Vol.43 (5R), p.2651 |
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| container_issue | 5R |
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| container_title | Japanese Journal of Applied Physics |
| container_volume | 43 |
| creator | Sun, Ho-Jung Choi, Eun Seok Lee, Tae Kwon Hong, Tae Eun Yang, Jun-Mo Kweon, Soon Yong Kim, Nam Kyeong Yeom, Seung Jin Roh, Jae-Sung Sohn, Hyun-chul Kim, Jin Woong |
| description | High-temperature Pb(Zr,Ti)O
3
(PZT) metal-organic chemical vapor deposition (MOCVD) at 620°C was performed on two major bottom electrode candidates, namely, a hybrid Pt/IrO
2
/Ir stack electrode and a single-layer Ir electrode. The structural stabilities of both PZT/electrode stacks were investigated. Severe interaction between PZT and the underlayered Pt films was observed, and the interaction resulted in a pyrochlore phase in the PZT film and blister-type deformation in the Pt film. On the other hand, structural stability, which served as the basis for a well-crystallized perovskite PZT film, was preserved in the case of the Ir electrode. Therefore, it could be determined that the Ir electrode as a bottom electrode was better than the Pt electrode from the point of view of the structural stability of a capacitor stack, when high-temperature MOCVD is chosen as a preparation method. |
| doi_str_mv | 10.1143/JJAP.43.2651 |
| format | Article |
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3
(PZT) metal-organic chemical vapor deposition (MOCVD) at 620°C was performed on two major bottom electrode candidates, namely, a hybrid Pt/IrO
2
/Ir stack electrode and a single-layer Ir electrode. The structural stabilities of both PZT/electrode stacks were investigated. Severe interaction between PZT and the underlayered Pt films was observed, and the interaction resulted in a pyrochlore phase in the PZT film and blister-type deformation in the Pt film. On the other hand, structural stability, which served as the basis for a well-crystallized perovskite PZT film, was preserved in the case of the Ir electrode. Therefore, it could be determined that the Ir electrode as a bottom electrode was better than the Pt electrode from the point of view of the structural stability of a capacitor stack, when high-temperature MOCVD is chosen as a preparation method.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.43.2651</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2004-05, Vol.43 (5R), p.2651</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c801-4bd12c7e419494313ae98c3610ae009f812b135a2dfb52e4a4328c0c1cd9b9ff3</citedby><cites>FETCH-LOGICAL-c801-4bd12c7e419494313ae98c3610ae009f812b135a2dfb52e4a4328c0c1cd9b9ff3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Sun, Ho-Jung</creatorcontrib><creatorcontrib>Choi, Eun Seok</creatorcontrib><creatorcontrib>Lee, Tae Kwon</creatorcontrib><creatorcontrib>Hong, Tae Eun</creatorcontrib><creatorcontrib>Yang, Jun-Mo</creatorcontrib><creatorcontrib>Kweon, Soon Yong</creatorcontrib><creatorcontrib>Kim, Nam Kyeong</creatorcontrib><creatorcontrib>Yeom, Seung Jin</creatorcontrib><creatorcontrib>Roh, Jae-Sung</creatorcontrib><creatorcontrib>Sohn, Hyun-chul</creatorcontrib><creatorcontrib>Kim, Jin Woong</creatorcontrib><title>Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O 3 Thin Films on Structural Stabilities of Hybrid Pt/IrO 2 /Ir Stack and Single-Layer Ir Bottom Electrodes</title><title>Japanese Journal of Applied Physics</title><description>High-temperature Pb(Zr,Ti)O
3
(PZT) metal-organic chemical vapor deposition (MOCVD) at 620°C was performed on two major bottom electrode candidates, namely, a hybrid Pt/IrO
2
/Ir stack electrode and a single-layer Ir electrode. The structural stabilities of both PZT/electrode stacks were investigated. Severe interaction between PZT and the underlayered Pt films was observed, and the interaction resulted in a pyrochlore phase in the PZT film and blister-type deformation in the Pt film. On the other hand, structural stability, which served as the basis for a well-crystallized perovskite PZT film, was preserved in the case of the Ir electrode. Therefore, it could be determined that the Ir electrode as a bottom electrode was better than the Pt electrode from the point of view of the structural stability of a capacitor stack, when high-temperature MOCVD is chosen as a preparation method.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNotkMtOwzAQRS0EEuWx4wNmCRIpfiUkSygttCpqpUYs2ESOM24NeVSOWfTb-DkcldXRaObembmE3DA6ZkyKh8XiaT2WYsyTmJ2QERPyMZI0iU_JiFLOIplxfk4u-v4rlEks2Yj8To1B7XvoDLzZ7S7KsdmjU_7HIbyjV3W0clvVWg2THTZWqxo-1L5z8IL7rrfedu2gXZe3n-4-t3crEJDvbAszWzfBtoWNdz86-AXlxqvS1kGEx4WH0tkK1v5h7lbAIWAY0d-g2go2tt3WGC3VAR2EznPnfdfAtA73uq7C_oqcGVX3eP3PS5LPpvnkLVquXueTp2WkUxqeLivG9SNKlslMCiYUZqkWCaMKKc1MynjJRKx4ZcqYo1RS8FRTzXSVlZkx4pLcH2216_reoSn2zjbKHQpGiyH3Ysi9CBxyF3-5w3ZJ</recordid><startdate>20040501</startdate><enddate>20040501</enddate><creator>Sun, Ho-Jung</creator><creator>Choi, Eun Seok</creator><creator>Lee, Tae Kwon</creator><creator>Hong, Tae Eun</creator><creator>Yang, Jun-Mo</creator><creator>Kweon, Soon Yong</creator><creator>Kim, Nam Kyeong</creator><creator>Yeom, Seung Jin</creator><creator>Roh, Jae-Sung</creator><creator>Sohn, Hyun-chul</creator><creator>Kim, Jin Woong</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20040501</creationdate><title>Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O 3 Thin Films on Structural Stabilities of Hybrid Pt/IrO 2 /Ir Stack and Single-Layer Ir Bottom Electrodes</title><author>Sun, Ho-Jung ; Choi, Eun Seok ; Lee, Tae Kwon ; Hong, Tae Eun ; Yang, Jun-Mo ; Kweon, Soon Yong ; Kim, Nam Kyeong ; Yeom, Seung Jin ; Roh, Jae-Sung ; Sohn, Hyun-chul ; Kim, Jin Woong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c801-4bd12c7e419494313ae98c3610ae009f812b135a2dfb52e4a4328c0c1cd9b9ff3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sun, Ho-Jung</creatorcontrib><creatorcontrib>Choi, Eun Seok</creatorcontrib><creatorcontrib>Lee, Tae Kwon</creatorcontrib><creatorcontrib>Hong, Tae Eun</creatorcontrib><creatorcontrib>Yang, Jun-Mo</creatorcontrib><creatorcontrib>Kweon, Soon Yong</creatorcontrib><creatorcontrib>Kim, Nam Kyeong</creatorcontrib><creatorcontrib>Yeom, Seung Jin</creatorcontrib><creatorcontrib>Roh, Jae-Sung</creatorcontrib><creatorcontrib>Sohn, Hyun-chul</creatorcontrib><creatorcontrib>Kim, Jin Woong</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sun, Ho-Jung</au><au>Choi, Eun Seok</au><au>Lee, Tae Kwon</au><au>Hong, Tae Eun</au><au>Yang, Jun-Mo</au><au>Kweon, Soon Yong</au><au>Kim, Nam Kyeong</au><au>Yeom, Seung Jin</au><au>Roh, Jae-Sung</au><au>Sohn, Hyun-chul</au><au>Kim, Jin Woong</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O 3 Thin Films on Structural Stabilities of Hybrid Pt/IrO 2 /Ir Stack and Single-Layer Ir Bottom Electrodes</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2004-05-01</date><risdate>2004</risdate><volume>43</volume><issue>5R</issue><spage>2651</spage><pages>2651-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>High-temperature Pb(Zr,Ti)O
3
(PZT) metal-organic chemical vapor deposition (MOCVD) at 620°C was performed on two major bottom electrode candidates, namely, a hybrid Pt/IrO
2
/Ir stack electrode and a single-layer Ir electrode. The structural stabilities of both PZT/electrode stacks were investigated. Severe interaction between PZT and the underlayered Pt films was observed, and the interaction resulted in a pyrochlore phase in the PZT film and blister-type deformation in the Pt film. On the other hand, structural stability, which served as the basis for a well-crystallized perovskite PZT film, was preserved in the case of the Ir electrode. Therefore, it could be determined that the Ir electrode as a bottom electrode was better than the Pt electrode from the point of view of the structural stability of a capacitor stack, when high-temperature MOCVD is chosen as a preparation method.</abstract><doi>10.1143/JJAP.43.2651</doi></addata></record> |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| title | Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr,Ti)O 3 Thin Films on Structural Stabilities of Hybrid Pt/IrO 2 /Ir Stack and Single-Layer Ir Bottom Electrodes |
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