Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope

Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope

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Veröffentlicht in:Japanese Journal of Applied Physics 2002, Vol.41 (Part 1, No. 2A), p.915-917
Hauptverfasser: Koike, Toru, Ikeda, Takahiro, Miyoshi, Motosuke, Okumura, Katsuya, Ura, Katsumi
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container_end_page 917
container_issue Part 1, No. 2A
container_start_page 915
container_title Japanese Journal of Applied Physics
container_volume 41
creator Koike, Toru
Ikeda, Takahiro
Miyoshi, Motosuke
Okumura, Katsuya
Ura, Katsumi
description
doi_str_mv 10.1143/JJAP.41.915
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_41_915</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_41_915</sourcerecordid><originalsourceid>FETCH-LOGICAL-c297t-664eaec3a04f17fca95103be976416b87bceb038acf46a14c8aa91d6032895053</originalsourceid><addsrcrecordid>eNpVkM1OwzAQhC0EEqVw4gV8Ry7e2HHiY6lKoeoPEnCONu4mDUqTyglF4elJBBdOo5nVzkgfY7cgJwBa3S-X05eJhomF8IyNQOlIaGnCczaSMgChbRBcsqum-eitCTWM2PfUuU-PruN1xrcn8iV2fE2tr8s67_hX0e75pq6Ogqo-xLaoco7Vjm8o782JxGyPPh_SeUmuf6v4A-FhaGv3xF8dVtW_67pwvm5cfaRrdpFh2dDNn47Z--P8bfYkVtvF82y6Ei6wUSuM0YTkFEqdQZQ5tCFIlZKNjAaTxlHqKJUqRpdpg6BdjGhhZ6QKYhvKUI3Z3W_vMNx4ypKjLw7ouwRkMmBLBmyJhqTHpn4AN0Rhxg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Koike, Toru ; Ikeda, Takahiro ; Miyoshi, Motosuke ; Okumura, Katsuya ; Ura, Katsumi</creator><creatorcontrib>Koike, Toru ; Ikeda, Takahiro ; Miyoshi, Motosuke ; Okumura, Katsuya ; Ura, Katsumi</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.41.915</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2002, Vol.41 (Part 1, No. 2A), p.915-917</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c297t-664eaec3a04f17fca95103be976416b87bceb038acf46a14c8aa91d6032895053</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4010,27900,27901,27902</link.rule.ids></links><search><creatorcontrib>Koike, Toru</creatorcontrib><creatorcontrib>Ikeda, Takahiro</creatorcontrib><creatorcontrib>Miyoshi, Motosuke</creatorcontrib><creatorcontrib>Okumura, Katsuya</creatorcontrib><creatorcontrib>Ura, Katsumi</creatorcontrib><title>Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope</title><title>Japanese Journal of Applied Physics</title><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNpVkM1OwzAQhC0EEqVw4gV8Ry7e2HHiY6lKoeoPEnCONu4mDUqTyglF4elJBBdOo5nVzkgfY7cgJwBa3S-X05eJhomF8IyNQOlIaGnCczaSMgChbRBcsqum-eitCTWM2PfUuU-PruN1xrcn8iV2fE2tr8s67_hX0e75pq6Ogqo-xLaoco7Vjm8o782JxGyPPh_SeUmuf6v4A-FhaGv3xF8dVtW_67pwvm5cfaRrdpFh2dDNn47Z--P8bfYkVtvF82y6Ei6wUSuM0YTkFEqdQZQ5tCFIlZKNjAaTxlHqKJUqRpdpg6BdjGhhZ6QKYhvKUI3Z3W_vMNx4ypKjLw7ouwRkMmBLBmyJhqTHpn4AN0Rhxg</recordid><startdate>2002</startdate><enddate>2002</enddate><creator>Koike, Toru</creator><creator>Ikeda, Takahiro</creator><creator>Miyoshi, Motosuke</creator><creator>Okumura, Katsuya</creator><creator>Ura, Katsumi</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2002</creationdate><title>Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope</title><author>Koike, Toru ; Ikeda, Takahiro ; Miyoshi, Motosuke ; Okumura, Katsuya ; Ura, Katsumi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c297t-664eaec3a04f17fca95103be976416b87bceb038acf46a14c8aa91d6032895053</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Koike, Toru</creatorcontrib><creatorcontrib>Ikeda, Takahiro</creatorcontrib><creatorcontrib>Miyoshi, Motosuke</creatorcontrib><creatorcontrib>Okumura, Katsuya</creatorcontrib><creatorcontrib>Ura, Katsumi</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Koike, Toru</au><au>Ikeda, Takahiro</au><au>Miyoshi, Motosuke</au><au>Okumura, Katsuya</au><au>Ura, Katsumi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2002</date><risdate>2002</risdate><volume>41</volume><issue>Part 1, No. 2A</issue><spage>915</spage><epage>917</epage><pages>915-917</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.1143/JJAP.41.915</doi><tpages>3</tpages></addata></record>
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1347-4065
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recordid cdi_crossref_primary_10_1143_JJAP_41_915
source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Accuracy of Overlay Metrology with Nonp-enetrating and Negative-Charging Electron Beam of the Scanning Electron Microscope
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T19%3A07%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Accuracy%20of%20Overlay%20Metrology%20with%20Nonp-enetrating%20and%20Negative-Charging%20Electron%20Beam%20of%20the%20Scanning%20Electron%20Microscope&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Koike,%20Toru&rft.date=2002&rft.volume=41&rft.issue=Part%201,%20No.%202A&rft.spage=915&rft.epage=917&rft.pages=915-917&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.41.915&rft_dat=%3Ccrossref%3E10_1143_JJAP_41_915%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true