Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching
We propose the use of a high numerical-aperture (NA) microlens formed by plasma etching for an optical recording application. It was found through optical recording experiments that a microlens formed by plasma etching is applicable to a tiny objective lens.
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| Veröffentlicht in: | Japanese Journal of Applied Physics 2001, Vol.40 (3S), p.1792 |
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| Sprache: | eng |
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| container_issue | 3S |
| container_start_page | 1792 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 40 |
| creator | Kouchiyama, Akira Ichimura, Isao Kishima, Koichiro Nakao, Takashi Yamamoto, Kenji Hashimoto, Gakuji Iida, Atsushi Osato, Kiyoshi |
| description | We propose the use of a high numerical-aperture (NA) microlens formed by plasma etching for an optical recording application. It was found through optical recording experiments that a microlens formed by plasma etching is applicable to a tiny objective lens. |
| doi_str_mv | 10.1143/JJAP.40.1792 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 2001, Vol.40 (3S), p.1792 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_crossref_primary_10_1143_JJAP_40_1792 |
| source | Institute of Physics Journals |
| title | Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching |
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