Study of Pt Bottom Electrodes using High-Temperature Sputtering for Ferroelectric Memories with SrBi 2 Ta 2 O 9 (SBTO) Film
Pt bottom electrodes for SrBi 2 Ta 2 O 9 (SBTO) capacitors have been investigated for use in nonvolatile memories. A Pt thin film which is sputtered at a temperature of 300°C consists of enlarged columnar grains, while a film sputtered at room temperature consists of fibrous columnar grains. The for...
Gespeichert in:
Veröffentlicht in: | Japanese Journal of Applied Physics 1998-07, Vol.37 (7R), p.4144 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!