A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface

Taking Van der Waals force and cleaning force due to fast thermal expansion of substrate surface induced by pulsed laser irradiation into account, a cleaning model was established for removal of tiny particles from substrate surfaces. The cleaning condition and cleaning threshold can be obtained fro...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1997-10, Vol.36 (10A), p.L1304-L1306
Hauptverfasser:	LU, Y.-F, SONG, W.-D, YE, K.-D, LEE, Y.-P, CHAN, D. S. H, LOW, T.-S
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Surface cleaning, etching, patterning Surface treatments
Online-Zugang:	Volltext
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