A method for identifying sources of reactive ion etch lag and loading in a magnetically enhanced reactive ion etcher

The objective of this paper is to establish a diagnostic method for etch processes which involves identification of the possible sources of reactive ion etch (RIE) lag and loading and the systematic examination and elimination as appropriate for a magnetically enhanced reactive ion etch (MERIE) cham...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1997-07, Vol.36 (7B), p.4838-4844
Hauptverfasser:	BUIE, M. J, PENDER, J. T. P, VENTZEK, P. L. G
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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