Orientation of vanadyl phthalocyanine grown by molecular beam epitaxy on KBr-KCl mixed crystals with various lattice constants
We have studied the effect of the lattice constants of substrates on the crystal orientation of films grown by molecular beam epitaxy. Vanadyl phthalocyanine films were epitaxially grown on KBr-KCl mixed crystals with continuously varying lattice constants. The unidirectional (3×3) R 45° orientation...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 1996-09, Vol.35 (9A), p.L1120-L1123 |
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| container_end_page | L1123 |
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| container_issue | 9A |
| container_start_page | L1120 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 35 |
| creator | HAMAMOTO, K.-I NAKAO, S GOMYOU, M HOSHI, H ISHIKAWA, K TAKEZOE, H FUKUDA, A |
| description | We have studied the effect of the lattice constants of substrates on the crystal orientation of films grown by molecular beam epitaxy. Vanadyl phthalocyanine films were epitaxially grown on KBr-KCl mixed crystals with continuously varying lattice constants. The unidirectional (3×3)
R
45° orientation and the bidirectional (√10×√10)
R
±27° orientation were predominant on the KBr-rich and KCl-rich substrates, respectively. We found that the orientation changes from the (3×3)
R
45° structure to the (√10×√10)
R
±27° structure at about the KCl fractions of 20 wt%. |
| doi_str_mv | 10.1143/jjap.35.l1120 |
| format | Article |
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R
45° orientation and the bidirectional (√10×√10)
R
±27° orientation were predominant on the KBr-rich and KCl-rich substrates, respectively. We found that the orientation changes from the (3×3)
R
45° structure to the (√10×√10)
R
±27° structure at about the KCl fractions of 20 wt%.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.35.l1120</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Molecular, atomic, ion, and chemical beam epitaxy ; Physics</subject><ispartof>Japanese Journal of Applied Physics, 1996-09, Vol.35 (9A), p.L1120-L1123</ispartof><rights>1996 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c330t-b492a855f9aa07de4e15e25b7c9013ae8eeb2fb53b0364c64beb9fd96fb9a23b3</citedby><cites>FETCH-LOGICAL-c330t-b492a855f9aa07de4e15e25b7c9013ae8eeb2fb53b0364c64beb9fd96fb9a23b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3213778$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>HAMAMOTO, K.-I</creatorcontrib><creatorcontrib>NAKAO, S</creatorcontrib><creatorcontrib>GOMYOU, M</creatorcontrib><creatorcontrib>HOSHI, H</creatorcontrib><creatorcontrib>ISHIKAWA, K</creatorcontrib><creatorcontrib>TAKEZOE, H</creatorcontrib><creatorcontrib>FUKUDA, A</creatorcontrib><title>Orientation of vanadyl phthalocyanine grown by molecular beam epitaxy on KBr-KCl mixed crystals with various lattice constants</title><title>Japanese Journal of Applied Physics</title><description>We have studied the effect of the lattice constants of substrates on the crystal orientation of films grown by molecular beam epitaxy. Vanadyl phthalocyanine films were epitaxially grown on KBr-KCl mixed crystals with continuously varying lattice constants. The unidirectional (3×3)
R
45° orientation and the bidirectional (√10×√10)
R
±27° orientation were predominant on the KBr-rich and KCl-rich substrates, respectively. We found that the orientation changes from the (3×3)
R
45° structure to the (√10×√10)
R
±27° structure at about the KCl fractions of 20 wt%.</description><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Molecular, atomic, ion, and chemical beam epitaxy</subject><subject>Physics</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNo9kL1PwzAUxC0EEqUwsntgTfFHnDRjqfhqK5UB5ujZsakr14lslzYLfztBRUynp_vd6ekQuqVkQmnO77db6CZcTByljJyhEeV5meWkEOdoRAijWV4xdomuYtwOZyFyOkLf62C1T5Bs63Fr8Bd4aHqHu03agGtVD956jT9De_BY9njXOq32DgKWGnZYdzbBscdDePkQsuXc4Z096gar0McELuKDTZuhNdh2H7GDlKzSWLV-cH2K1-jCDJS--dMx-nh6fJ-_ZKv18-t8tsoU5yRlcvgcpkKYCoCUjc41FZoJWaqKUA56qrVkRgouCS9yVeRSy8o0VWFkBYxLPkbZqVeFNsagTd0Fu4PQ15TUv-PVi8XsreaiXv2ON_B3J76DqMCZAF7Z-B_ijPKynPIf4kVzVA</recordid><startdate>19960901</startdate><enddate>19960901</enddate><creator>HAMAMOTO, K.-I</creator><creator>NAKAO, S</creator><creator>GOMYOU, M</creator><creator>HOSHI, H</creator><creator>ISHIKAWA, K</creator><creator>TAKEZOE, H</creator><creator>FUKUDA, A</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19960901</creationdate><title>Orientation of vanadyl phthalocyanine grown by molecular beam epitaxy on KBr-KCl mixed crystals with various lattice constants</title><author>HAMAMOTO, K.-I ; NAKAO, S ; GOMYOU, M ; HOSHI, H ; ISHIKAWA, K ; TAKEZOE, H ; FUKUDA, A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c330t-b492a855f9aa07de4e15e25b7c9013ae8eeb2fb53b0364c64beb9fd96fb9a23b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1996</creationdate><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Molecular, atomic, ion, and chemical beam epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>HAMAMOTO, K.-I</creatorcontrib><creatorcontrib>NAKAO, S</creatorcontrib><creatorcontrib>GOMYOU, M</creatorcontrib><creatorcontrib>HOSHI, H</creatorcontrib><creatorcontrib>ISHIKAWA, K</creatorcontrib><creatorcontrib>TAKEZOE, H</creatorcontrib><creatorcontrib>FUKUDA, A</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>HAMAMOTO, K.-I</au><au>NAKAO, S</au><au>GOMYOU, M</au><au>HOSHI, H</au><au>ISHIKAWA, K</au><au>TAKEZOE, H</au><au>FUKUDA, A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Orientation of vanadyl phthalocyanine grown by molecular beam epitaxy on KBr-KCl mixed crystals with various lattice constants</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1996-09-01</date><risdate>1996</risdate><volume>35</volume><issue>9A</issue><spage>L1120</spage><epage>L1123</epage><pages>L1120-L1123</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>We have studied the effect of the lattice constants of substrates on the crystal orientation of films grown by molecular beam epitaxy. Vanadyl phthalocyanine films were epitaxially grown on KBr-KCl mixed crystals with continuously varying lattice constants. The unidirectional (3×3)
R
45° orientation and the bidirectional (√10×√10)
R
±27° orientation were predominant on the KBr-rich and KCl-rich substrates, respectively. We found that the orientation changes from the (3×3)
R
45° structure to the (√10×√10)
R
±27° structure at about the KCl fractions of 20 wt%.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.35.l1120</doi></addata></record> |
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| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 1996-09, Vol.35 (9A), p.L1120-L1123 |
| issn | 0021-4922 1347-4065 |
| language | eng |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Molecular, atomic, ion, and chemical beam epitaxy Physics |
| title | Orientation of vanadyl phthalocyanine grown by molecular beam epitaxy on KBr-KCl mixed crystals with various lattice constants |
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