Nanofabrication with a novel EB system with a large and stable beam current
We describe nanofabrication using a novel electron beam (EB) system that has a large and stable beam current, combined with high resolution resists. This system has a low aberration objective lens and a Zr/O/W cathode that provides a probe current of 1.2 nA. By detecting Si-groove marks, the system...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 1996-12, Vol.35 (12B), p.6421-6425 |
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| Format: | Artikel |
| Sprache: | eng |
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| container_end_page | 6425 |
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| container_issue | 12B |
| container_start_page | 6421 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 35 |
| creator | YOSHIMURA, T OHTA, H YAMAMOTO, J UCHINO, S.-I GOTOH, Y TERASAWA, T |
| description | We describe nanofabrication using a novel electron beam (EB) system that has a large and stable beam current, combined with high resolution resists. This system has a low aberration objective lens and a Zr/O/W cathode that provides a probe current of 1.2 nA. By detecting Si-groove marks, the system achieves high overlay accuracy of within 10 nm ( mean+3σ) over large areas. We have realized resist nanofabrication down to 10 nm with small nano edge roughness. By introducing a hard mask consisting of a thin (25 nm) SiO
2
layer, we have also obtained a poly-Si gate structure of 30 nm on a thin (4 nm) gate oxide. |
| doi_str_mv | 10.1143/jjap.35.6421 |
| format | Article |
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2
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2
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| fulltext | fulltext |
| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 1996-12, Vol.35 (12B), p.6421-6425 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_crossref_primary_10_1143_JJAP_35_6421 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | Nanofabrication with a novel EB system with a large and stable beam current |
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