Precision improvement in optical proximity correction by optimizing second illumination source shape

We have achieved precision improvement by optimizing the second illumination source shape in our optical proximity correction system. Based on the consideration that the optical proximity effect is significantly dependent on interference conditions, we have applied a new type of modified illuminatio...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1996-12, Vol.35 (12B), p.6395-6399
Hauptverfasser:	NAKAE, A, KAMON, K, HANAWA, T, MORIIZUMI, K, NAKAO, S
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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