MASCOT : Mask pattern correction tool using genetic algorithm

We propose a new optical proximity correction (OPC) method using a polygonal mask model and a genetic algorithm (GA). With the polygonal mask model, our method can generate simple and practical masks that satisfy the constraints arising from manufacturing requirements. A robust optimization method,...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1996, Vol.35 (12B), p.6374-6378
Hauptverfasser:	HARUKI, T, ASAI, S, NAKAGAWA, K, HANYU, I
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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