Elemental composition of reactively sputtered indium nitride thin films

Indium nitride (InN) thin films have been grown on a variety of substrates using low-temperature radio frequency reactive sputtering of indium metal in pure nitrogen plasma. Quantitative compositional analyses of the films, carried out using X-ray photoelectron spectroscopy (XPS) and Rutherford back...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1996, Vol.35 (4A), p.2261-2265
Hauptverfasser:	KUMAR, S, MO, L, MO MOTLAN, L, TANSLEY, T. L
Format:	Artikel
Sprache:	eng
Schlagworte:	Composition and phase identification Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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