Molecular design of dissolution inhibitor in chemical amplification resist system by molecular orbital method : transparency and reactivities with protons

The molecular orbital (MO) method has been applied to study the transparency of any dissolution inhibitors in the deep-UV region and the reactivities of those molecules with protons derived from a photoacid generator in a chemical amplification resist system for excimer laser lithography. The result...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1995-02, Vol.34 (2A), p.623-629
Hauptverfasser:	NOBUTOKI, H, KUMADA, T, KOEZUKA, H
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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