Atomically resolved image of cleaved GaAs(110) surface observed with an ultrahigh vacuum atomic force microscope

The first demonstration of atomic-resolution imaging of a GaAs(110) surface with an ultrahigh vacuum atomic force microscope (UHV AFM) is performed. A rectangular lattice with spacing of 5.7±0.5 Å×4.0±0.4 Å is resolved. This result suggests that the UHV AFM has potential capability for investigating...

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Veröffentlicht in:Japanese Journal of Applied Physics 1994, Vol.33 (1A), p.L52-L54
Hauptverfasser: OHTA, M, SUGAWARA, Y, HONTANI, K, MORITA, S, OSAKA, F, SUZUKI, M, NAGAOKA, H, MISHIMA, S, OKADA, T
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Sprache:eng
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Zusammenfassung:The first demonstration of atomic-resolution imaging of a GaAs(110) surface with an ultrahigh vacuum atomic force microscope (UHV AFM) is performed. A rectangular lattice with spacing of 5.7±0.5 Å×4.0±0.4 Å is resolved. This result suggests that the UHV AFM has potential capability for investigating semiconductor surfaces having dangling bonds on an atomic scale.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.33.l52