Application of High-Resolution Film for Lithography to Synchrotron X-Ray Topography

A high-resolution film for lithography is applied to a detector for synchrotron radiation topography, instead of a nuclear plate. The film shows much better resolution than that of the plate although exposure time an about 500 times longer is required. The size distribution of interstitial loops gro...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1994, Vol.33 (8), p.4793-4794, Article 2280
Hauptverfasser:	MIZUNO, K, IWAMI, M, HASHIMOTO, E, ITO, K, KINO, T
Format:	Artikel
Sprache:	eng
Schlagworte:	Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Physics X- and γ-ray instruments and techniques
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	A high-resolution film for lithography is applied to a detector for synchrotron radiation topography, instead of a nuclear plate. The film shows much better resolution than that of the plate although exposure time an about 500 times longer is required. The size distribution of interstitial loops grown as vacancy sources in a nearly perfect aluminum crystal after a temperature rise is examined from the white beam topograph.
ISSN:	0021-4922 1347-4065
DOI:	10.1143/JJAP.33.4793