Patterning Characteristics of Oblique Illumination Optical Lithography

The patterning characteristics of oblique illumination lithography are investigated. When the reticle is illuminated obliquely, the pattern widths corresponding to the opaque parts of the reticle are apt to become thinner than those replicated by conventional optical lithography. This characteristic...

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Veröffentlicht in:	Japanese Journal of Applied Physics 1994, Vol.33 (5R), p.2779
Hauptverfasser:	Horiuchi, Toshiyuki, Takeuchi, Yoshinobu, Tamechika, Emi, Mimura, Yoshiaki, Seitaro Matsuo, Seitaro Matsuo, Katsuhiro Harada, Katsuhiro Harada
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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