Absorption coefficient and sensitivity of positive and negative resists in the vacuum ultraviolet region
Absorption coefficients for the resist materials (polymethyl methacrylate (PMMA) and partially chloromethylated polystyrene (CMS-DU)) were obtained in the vacuum ultraviolet (VUV) region. Negative and positive resist characteristics were investigated using a coherent VUV radiation source (λ=110-150...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 1992-02, Vol.31 (2A), p.401-404 |
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| container_end_page | 404 |
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| container_issue | 2A |
| container_start_page | 401 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 31 |
| creator | KUDO, K MIYAZAKI, K SAKAI, H IWABUCHI, T MUTOH, K MIYATA, T TOMIKI, T |
| description | Absorption coefficients for the resist materials (polymethyl methacrylate (PMMA) and partially chloromethylated polystyrene (CMS-DU)) were obtained in the vacuum ultraviolet (VUV) region. Negative and positive resist characteristics were investigated using a coherent VUV radiation source (λ=110-150 nm) generated by two-photon resonant four-wave mixing in Cd vapor. A very low exposure energy of approximately 1 mJ/cm
2
was realized by employing a very thin resist film and using VUV light from the high-absorption region of the resist materials. |
| doi_str_mv | 10.1143/jjap.31.401 |
| format | Article |
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2
was realized by employing a very thin resist film and using VUV light from the high-absorption region of the resist materials.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.31.401</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Applied sciences ; Electrical, magnetic and optical properties ; Exact sciences and technology ; Organic polymers ; Physicochemistry of polymers ; Properties and characterization</subject><ispartof>Japanese Journal of Applied Physics, 1992-02, Vol.31 (2A), p.401-404</ispartof><rights>1992 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c355t-24da7191e1bfab44bc77012119084007f327730370cb093ddbc6831e815971933</citedby><cites>FETCH-LOGICAL-c355t-24da7191e1bfab44bc77012119084007f327730370cb093ddbc6831e815971933</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=5318597$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>KUDO, K</creatorcontrib><creatorcontrib>MIYAZAKI, K</creatorcontrib><creatorcontrib>SAKAI, H</creatorcontrib><creatorcontrib>IWABUCHI, T</creatorcontrib><creatorcontrib>MUTOH, K</creatorcontrib><creatorcontrib>MIYATA, T</creatorcontrib><creatorcontrib>TOMIKI, T</creatorcontrib><title>Absorption coefficient and sensitivity of positive and negative resists in the vacuum ultraviolet region</title><title>Japanese Journal of Applied Physics</title><description>Absorption coefficients for the resist materials (polymethyl methacrylate (PMMA) and partially chloromethylated polystyrene (CMS-DU)) were obtained in the vacuum ultraviolet (VUV) region. Negative and positive resist characteristics were investigated using a coherent VUV radiation source (λ=110-150 nm) generated by two-photon resonant four-wave mixing in Cd vapor. A very low exposure energy of approximately 1 mJ/cm
2
was realized by employing a very thin resist film and using VUV light from the high-absorption region of the resist materials.</description><subject>Applied sciences</subject><subject>Electrical, magnetic and optical properties</subject><subject>Exact sciences and technology</subject><subject>Organic polymers</subject><subject>Physicochemistry of polymers</subject><subject>Properties and characterization</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNo9kD1PwzAURS0EEqUw8Qc8sKEUvzynTsaq4quqBAPMkePYravUiWynUv89pkVMT1fv3DNcQu6BzQA4Pu12cpghzDiDCzIB5CLjbF5ckgljOWS8yvNrchPCLsV5wWFCtosm9H6ItndU9doYq6x2kUrX0qBdsNEebDzS3tChPyV9-jm9kafgdbAhBmodjVtND1KN456OXfTyYPtOx0Rskv2WXBnZBX33d6fk--X5a_mWrT9e35eLdaawKGKW81YKqEBDY2TDeaOEYJADVKzkjAmDuRDIUDDVsArbtlHzEkGXUFSphzglj2ev8n0IXpt68HYv_bEGVv-OVK9Wi88aoU4jJfrhTA8yKNkZL52y4b9SIJTJiz_FhGgz</recordid><startdate>19920201</startdate><enddate>19920201</enddate><creator>KUDO, K</creator><creator>MIYAZAKI, K</creator><creator>SAKAI, H</creator><creator>IWABUCHI, T</creator><creator>MUTOH, K</creator><creator>MIYATA, T</creator><creator>TOMIKI, T</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19920201</creationdate><title>Absorption coefficient and sensitivity of positive and negative resists in the vacuum ultraviolet region</title><author>KUDO, K ; MIYAZAKI, K ; SAKAI, H ; IWABUCHI, T ; MUTOH, K ; MIYATA, T ; TOMIKI, T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c355t-24da7191e1bfab44bc77012119084007f327730370cb093ddbc6831e815971933</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1992</creationdate><topic>Applied sciences</topic><topic>Electrical, magnetic and optical properties</topic><topic>Exact sciences and technology</topic><topic>Organic polymers</topic><topic>Physicochemistry of polymers</topic><topic>Properties and characterization</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>KUDO, K</creatorcontrib><creatorcontrib>MIYAZAKI, K</creatorcontrib><creatorcontrib>SAKAI, H</creatorcontrib><creatorcontrib>IWABUCHI, T</creatorcontrib><creatorcontrib>MUTOH, K</creatorcontrib><creatorcontrib>MIYATA, T</creatorcontrib><creatorcontrib>TOMIKI, T</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>KUDO, K</au><au>MIYAZAKI, K</au><au>SAKAI, H</au><au>IWABUCHI, T</au><au>MUTOH, K</au><au>MIYATA, T</au><au>TOMIKI, T</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Absorption coefficient and sensitivity of positive and negative resists in the vacuum ultraviolet region</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1992-02-01</date><risdate>1992</risdate><volume>31</volume><issue>2A</issue><spage>401</spage><epage>404</epage><pages>401-404</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>Absorption coefficients for the resist materials (polymethyl methacrylate (PMMA) and partially chloromethylated polystyrene (CMS-DU)) were obtained in the vacuum ultraviolet (VUV) region. Negative and positive resist characteristics were investigated using a coherent VUV radiation source (λ=110-150 nm) generated by two-photon resonant four-wave mixing in Cd vapor. A very low exposure energy of approximately 1 mJ/cm
2
was realized by employing a very thin resist film and using VUV light from the high-absorption region of the resist materials.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.31.401</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
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| ispartof | Japanese Journal of Applied Physics, 1992-02, Vol.31 (2A), p.401-404 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_crossref_primary_10_1143_JJAP_31_401 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Applied sciences Electrical, magnetic and optical properties Exact sciences and technology Organic polymers Physicochemistry of polymers Properties and characterization |
| title | Absorption coefficient and sensitivity of positive and negative resists in the vacuum ultraviolet region |
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