Photolithography system using annular illumination

Photolithography system using annular illumination

Photolithography is a leading technique in LSI device fabrication. The LSI pattern size has approached the exposure wavelength such as the g or i-line of a Hg lamp. This fact indicates that the shorter wavelength or some novel technique will be needed in order to cope with finer patterns. It is know...

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Veröffentlicht in:Japanese Journal of Applied Physics 1991-11, Vol.30 (11B), p.3021-3029
Hauptverfasser: KAMON, K, MIYAMOTO, T, MYOI, Y, NAGATA, H, TANAKA, M, HORIE, K
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Sprache:eng
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Applied sciences
Electronic equipment and fabrication. Passive components, printed wiring boards, connectics
Electronics
Exact sciences and technology
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container_end_page 3029
container_issue 11B
container_start_page 3021
container_title Japanese Journal of Applied Physics
container_volume 30
creator KAMON, K
MIYAMOTO, T
MYOI, Y
NAGATA, H
TANAKA, M
HORIE, K
description Photolithography is a leading technique in LSI device fabrication. The LSI pattern size has approached the exposure wavelength such as the g or i-line of a Hg lamp. This fact indicates that the shorter wavelength or some novel technique will be needed in order to cope with finer patterns. It is known that annular illumination can improve the depth of focus and resolution. We applied the annular illumination method to the step and repeat exposure system. Experiments and simulations using annular illumination were carried out and subhalf-micron patterns were produced. The process latitudes of the annular illumination method are evaluated.
doi_str_mv 10.1143/jjap.30.3021
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Applied sciences
Electronic equipment and fabrication. Passive components, printed wiring boards, connectics
Electronics
Exact sciences and technology
title Photolithography system using annular illumination
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