Thermal diffusivity of crystalline and liquid silicon and an anomaly at melting

The thermal diffusivity of Si was measured by a laser flash method up to 1723 K. SiC and fused quartz cells were prepared for the measurement on the melt. The thermal conductivities of the crystal and the melt at the melting point were determined to be 27.3±0.3 and 56±1 W/mK, respectively. It is sug...

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Veröffentlicht in:Japanese Journal of Applied Physics 1991-10, Vol.30 (10), p.2423-2426
Hauptverfasser: YAMAMOTO, K, ABE, T, TAKASU, S.-I
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container_title Japanese Journal of Applied Physics
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creator YAMAMOTO, K
ABE, T
TAKASU, S.-I
description The thermal diffusivity of Si was measured by a laser flash method up to 1723 K. SiC and fused quartz cells were prepared for the measurement on the melt. The thermal conductivities of the crystal and the melt at the melting point were determined to be 27.3±0.3 and 56±1 W/mK, respectively. It is suggested that a new (metastable) phase exists in a narrow temperature range just above the melting point. It irreversibly transformed to ordinary liquid metal. The new phase may have very low emissivity, and/or large specific heat.
doi_str_mv 10.1143/jjap.30.2423
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source Institute of Physics Journals
subjects Condensed matter: structure, mechanical and thermal properties
Equations of state, phase equilibria, and phase transitions
Exact sciences and technology
Physics
Specific phase transitions
title Thermal diffusivity of crystalline and liquid silicon and an anomaly at melting
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