Preparation of High-T c Y-Ba-Cu-O Films by Three-Target Magnetron Sputtering
The mechanism of deviation in the composition of sputtered films from the target was studied using a three-target magnetron sputtering system. Films were prepared in two different deposition geometries: first, the three targets were facing the substrate, and second, they were turned far away from th...
Gespeichert in:
Veröffentlicht in: | Japanese Journal of Applied Physics 1990-04, Vol.29 (4A), p.L604 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!