Oxygen-doped Si epitaxial film (OXSEF)
We propose a new wide-gap material, an oxygen-doped Si epitaxial film (OXSEF), for applications to Si heterobipolar transistors (HBTs). OXSEF containing several tens of at.% of oxygen can be grown on a Si substrate by depositing Si in about 10 -6 Torr O 2 . OXSEF is literally almost a single crystal...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1987-11, Vol.26 (11), p.1830-1837 |
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container_end_page | 1837 |
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container_issue | 11 |
container_start_page | 1830 |
container_title | Japanese Journal of Applied Physics |
container_volume | 26 |
creator | TABE, M TAKAHASHI, M SAKAKIBARA, Y |
description | We propose a new wide-gap material, an oxygen-doped Si epitaxial film (OXSEF), for applications to Si heterobipolar transistors (HBTs). OXSEF containing several tens of at.% of oxygen can be grown on a Si substrate by depositing Si in about 10
-6
Torr O
2
. OXSEF is literally almost a single crystal with an identical crystalline structure to Si, although it includes {111} twins as defects caused by oxygen. Temperature and O
2
pressure dependences of oxygen concentration in OXSEF are dominated by oxygen adsorption on the Si surface. Oxygen atoms in OXSEF segregate to some extent toform incomplete oxides like SiO
1.5
, but complete phase separation as a mixture of Si and SiO
2
. regions does not occur, probably bcause of non-equilibrium conditions in MBE growth. Valence band discontinuity at the Si/OXSEF interface is deduced to be 0.26 eV based on photoelectrical measurements. |
doi_str_mv | 10.1143/jjap.26.1830 |
format | Article |
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-6
Torr O
2
. OXSEF is literally almost a single crystal with an identical crystalline structure to Si, although it includes {111} twins as defects caused by oxygen. Temperature and O
2
pressure dependences of oxygen concentration in OXSEF are dominated by oxygen adsorption on the Si surface. Oxygen atoms in OXSEF segregate to some extent toform incomplete oxides like SiO
1.5
, but complete phase separation as a mixture of Si and SiO
2
. regions does not occur, probably bcause of non-equilibrium conditions in MBE growth. Valence band discontinuity at the Si/OXSEF interface is deduced to be 0.26 eV based on photoelectrical measurements.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.26.1830</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology</subject><ispartof>Japanese Journal of Applied Physics, 1987-11, Vol.26 (11), p.1830-1837</ispartof><rights>1988 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c357t-acf3b359bece31e0eedd570f91ecb02e6d9f1af2181a909db407f2d3f8a172b63</citedby><cites>FETCH-LOGICAL-c357t-acf3b359bece31e0eedd570f91ecb02e6d9f1af2181a909db407f2d3f8a172b63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=7804914$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>TABE, M</creatorcontrib><creatorcontrib>TAKAHASHI, M</creatorcontrib><creatorcontrib>SAKAKIBARA, Y</creatorcontrib><title>Oxygen-doped Si epitaxial film (OXSEF)</title><title>Japanese Journal of Applied Physics</title><description>We propose a new wide-gap material, an oxygen-doped Si epitaxial film (OXSEF), for applications to Si heterobipolar transistors (HBTs). OXSEF containing several tens of at.% of oxygen can be grown on a Si substrate by depositing Si in about 10
-6
Torr O
2
. OXSEF is literally almost a single crystal with an identical crystalline structure to Si, although it includes {111} twins as defects caused by oxygen. Temperature and O
2
pressure dependences of oxygen concentration in OXSEF are dominated by oxygen adsorption on the Si surface. Oxygen atoms in OXSEF segregate to some extent toform incomplete oxides like SiO
1.5
, but complete phase separation as a mixture of Si and SiO
2
. regions does not occur, probably bcause of non-equilibrium conditions in MBE growth. Valence band discontinuity at the Si/OXSEF interface is deduced to be 0.26 eV based on photoelectrical measurements.</description><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1987</creationdate><recordtype>article</recordtype><recordid>eNo9j11LwzAYhYMoWKd3_oBeiCiYmjdJk-ZyjE0dgwpT8C6k-ZCMbivNLrZ_v46JV4cD5znwIHQPpADg7HW1Ml1BRQEVIxcoA8Yl5kSUlygjhALmitJrdJPSaqii5JChx3p_-PUb7Ladd_ky5r6LO7OPps1DbNf5U_2znM6eb9FVMG3yd385Qt-z6dfkHS_qt4_JeIEtK-UOGxtYw0rVeOsZeOK9c6UkQYG3DaFeOBXABAoVGEWUaziRgToWKgOSNoKN0Mv51_bblHofdNfHtekPGog-Oer5fPypqdAnx2H-cJ53JlnTht5sbEz_jKwIVwN0BGbDUAs</recordid><startdate>19871101</startdate><enddate>19871101</enddate><creator>TABE, M</creator><creator>TAKAHASHI, M</creator><creator>SAKAKIBARA, Y</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19871101</creationdate><title>Oxygen-doped Si epitaxial film (OXSEF)</title><author>TABE, M ; TAKAHASHI, M ; SAKAKIBARA, Y</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c357t-acf3b359bece31e0eedd570f91ecb02e6d9f1af2181a909db407f2d3f8a172b63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1987</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>TABE, M</creatorcontrib><creatorcontrib>TAKAHASHI, M</creatorcontrib><creatorcontrib>SAKAKIBARA, Y</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>TABE, M</au><au>TAKAHASHI, M</au><au>SAKAKIBARA, Y</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Oxygen-doped Si epitaxial film (OXSEF)</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1987-11-01</date><risdate>1987</risdate><volume>26</volume><issue>11</issue><spage>1830</spage><epage>1837</epage><pages>1830-1837</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>We propose a new wide-gap material, an oxygen-doped Si epitaxial film (OXSEF), for applications to Si heterobipolar transistors (HBTs). OXSEF containing several tens of at.% of oxygen can be grown on a Si substrate by depositing Si in about 10
-6
Torr O
2
. OXSEF is literally almost a single crystal with an identical crystalline structure to Si, although it includes {111} twins as defects caused by oxygen. Temperature and O
2
pressure dependences of oxygen concentration in OXSEF are dominated by oxygen adsorption on the Si surface. Oxygen atoms in OXSEF segregate to some extent toform incomplete oxides like SiO
1.5
, but complete phase separation as a mixture of Si and SiO
2
. regions does not occur, probably bcause of non-equilibrium conditions in MBE growth. Valence band discontinuity at the Si/OXSEF interface is deduced to be 0.26 eV based on photoelectrical measurements.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.26.1830</doi><tpages>8</tpages></addata></record> |
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language | eng |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
title | Oxygen-doped Si epitaxial film (OXSEF) |
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