Heteroepitaxial growth and superstructure of Ge on Si(111)-7×7 and (100)-2×1 surfaces
The initial stage of the heteroepitaxy, and the superstructure of Ge on Si surfaces, have been investigated by LEED and AES. Germanium was evaporated on to a clean Si(111–7×7 surface and also on to an Si(100)–2×1 surface. The layer-by-layer growth of Ge films on the Si surfaces was confirmed from th...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1983-10, Vol.22 (10), p.1482-1488 |
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Sprache: | eng |
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