Properties of GaP Red-Emitting Diodes Grown by Liquid-Phase Epitaxy III. Effect of Holding Time at Growth Temperature
Effect of holding time after covering the substrate with epitaxy solution in n -on- p liquid-phase epitaxy of GaP red-emitting diodes is investigated. Emission efficiency increases sharply with increasing the holding time, reaches a maximum at 15–25 min. and then decreases. From measurements of the...
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Veröffentlicht in: | Japanese Journal of Applied Physics 1971-01, Vol.10 (1), p.117 |
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container_title | Japanese Journal of Applied Physics |
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creator | Kasami, Akinobu Naito, Makoto Toyama, Masaharu |
description | Effect of holding time after covering the substrate with epitaxy solution in
n
-on-
p
liquid-phase epitaxy of GaP red-emitting diodes is investigated. Emission efficiency increases sharply with increasing the holding time, reaches a maximum at 15–25 min. and then decreases. From measurements of the diodes photocurrent, this variation is shown to be due to the variation of Zn-O luminescent center concentration in the light-emitting region, and is explained by two competing processes. At a short holding time, the etching rate of the substrate surface in slightly unsaturated epitaxy solution is faster than the out-diffusion rate of zinc from the substrate surface. The surface layer deteriorated by preheating is then removed faster than it extends inward, and hence zinc and Zn-O pair concentrations in the active region increase with holding time. At a long holding time, the etching rate becomes slower than the diffusion rate, and zinc and Zn-O pair concentrations decrease. |
doi_str_mv | 10.1143/JJAP.10.117 |
format | Article |
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n
-on-
p
liquid-phase epitaxy of GaP red-emitting diodes is investigated. Emission efficiency increases sharply with increasing the holding time, reaches a maximum at 15–25 min. and then decreases. From measurements of the diodes photocurrent, this variation is shown to be due to the variation of Zn-O luminescent center concentration in the light-emitting region, and is explained by two competing processes. At a short holding time, the etching rate of the substrate surface in slightly unsaturated epitaxy solution is faster than the out-diffusion rate of zinc from the substrate surface. The surface layer deteriorated by preheating is then removed faster than it extends inward, and hence zinc and Zn-O pair concentrations in the active region increase with holding time. At a long holding time, the etching rate becomes slower than the diffusion rate, and zinc and Zn-O pair concentrations decrease.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.10.117</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 1971-01, Vol.10 (1), p.117</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2174-b14b62312a4f29d2bc77653268931fa42f867a1199e53486e8fd111bb931d0e63</citedby><cites>FETCH-LOGICAL-c2174-b14b62312a4f29d2bc77653268931fa42f867a1199e53486e8fd111bb931d0e63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kasami, Akinobu</creatorcontrib><creatorcontrib>Naito, Makoto</creatorcontrib><creatorcontrib>Toyama, Masaharu</creatorcontrib><title>Properties of GaP Red-Emitting Diodes Grown by Liquid-Phase Epitaxy III. Effect of Holding Time at Growth Temperature</title><title>Japanese Journal of Applied Physics</title><description>Effect of holding time after covering the substrate with epitaxy solution in
n
-on-
p
liquid-phase epitaxy of GaP red-emitting diodes is investigated. Emission efficiency increases sharply with increasing the holding time, reaches a maximum at 15–25 min. and then decreases. From measurements of the diodes photocurrent, this variation is shown to be due to the variation of Zn-O luminescent center concentration in the light-emitting region, and is explained by two competing processes. At a short holding time, the etching rate of the substrate surface in slightly unsaturated epitaxy solution is faster than the out-diffusion rate of zinc from the substrate surface. The surface layer deteriorated by preheating is then removed faster than it extends inward, and hence zinc and Zn-O pair concentrations in the active region increase with holding time. At a long holding time, the etching rate becomes slower than the diffusion rate, and zinc and Zn-O pair concentrations decrease.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1971</creationdate><recordtype>article</recordtype><recordid>eNotkFFLwzAcxIMoOKdPfoG8S2f_SZq0j2PWrWNgkflc0iZxkXWtSYbu29tuPh0_jruDQ-gR4hkAo8_r9bycnUFcoQlQJiIW8-QaTeKYQMQyQm7RnfdfA_KEwQQdS9f12gWrPe4MXsoSv2sV5a0NwR4-8Yvt1GAtXfdzwPUJb-z30aqo3Emvcd7bIH9PuCiKGc6N0U0YS1bdXo3ZrW01luEcDju81e2wJMPR6Xt0Y-Te64d_naKP13y7WEWbt2WxmG-ihoBgUQ2s5oQCkcyQTJG6EYInlPA0o2AkIyblQgJkmU4oS7lOjQKAuh5sFWtOp-jp0tu4znunTdU720p3qiCuxseq8bELCPoHDKJc9A</recordid><startdate>19710101</startdate><enddate>19710101</enddate><creator>Kasami, Akinobu</creator><creator>Naito, Makoto</creator><creator>Toyama, Masaharu</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19710101</creationdate><title>Properties of GaP Red-Emitting Diodes Grown by Liquid-Phase Epitaxy III. Effect of Holding Time at Growth Temperature</title><author>Kasami, Akinobu ; Naito, Makoto ; Toyama, Masaharu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2174-b14b62312a4f29d2bc77653268931fa42f867a1199e53486e8fd111bb931d0e63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1971</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kasami, Akinobu</creatorcontrib><creatorcontrib>Naito, Makoto</creatorcontrib><creatorcontrib>Toyama, Masaharu</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kasami, Akinobu</au><au>Naito, Makoto</au><au>Toyama, Masaharu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Properties of GaP Red-Emitting Diodes Grown by Liquid-Phase Epitaxy III. Effect of Holding Time at Growth Temperature</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1971-01-01</date><risdate>1971</risdate><volume>10</volume><issue>1</issue><spage>117</spage><pages>117-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>Effect of holding time after covering the substrate with epitaxy solution in
n
-on-
p
liquid-phase epitaxy of GaP red-emitting diodes is investigated. Emission efficiency increases sharply with increasing the holding time, reaches a maximum at 15–25 min. and then decreases. From measurements of the diodes photocurrent, this variation is shown to be due to the variation of Zn-O luminescent center concentration in the light-emitting region, and is explained by two competing processes. At a short holding time, the etching rate of the substrate surface in slightly unsaturated epitaxy solution is faster than the out-diffusion rate of zinc from the substrate surface. The surface layer deteriorated by preheating is then removed faster than it extends inward, and hence zinc and Zn-O pair concentrations in the active region increase with holding time. At a long holding time, the etching rate becomes slower than the diffusion rate, and zinc and Zn-O pair concentrations decrease.</abstract><doi>10.1143/JJAP.10.117</doi></addata></record> |
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title | Properties of GaP Red-Emitting Diodes Grown by Liquid-Phase Epitaxy III. Effect of Holding Time at Growth Temperature |
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