Effect of a transverse applied electric field on electron drift velocity in a GaAs quantum wire: A Monte Carlo simulation
A Monte Carlo simulation is run to study the electron transport in a thin undoped GaAs quantum wire under the influence of a transverse applied electric field. Phonon and surface-roughness scattering are included. Electron drift velocity is investigated as a function of roughness amplitude at a temp...
Gespeichert in:
Veröffentlicht in: | Russian microelectronics 2010-11, Vol.39 (6), p.411-417 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A Monte Carlo simulation is run to study the electron transport in a thin undoped GaAs quantum wire under the influence of a transverse applied electric field. Phonon and surface-roughness scattering are included. Electron drift velocity is investigated as a function of roughness amplitude at a temperature of 77 or 300 K and a longitudinal electric field of 10
4
or 10
5
V/m. A transverse applied field is shown to provide a means of controlling drift velocity, affecting the scattering rate. |
---|---|
ISSN: | 1063-7397 1608-3415 |
DOI: | 10.1134/S1063739710060065 |