On the morphology of Si/SiO2/Ni nanostructures with swift heavy ion tracks in silicon oxide

Si/SiO 2 /Ni nanostructures are fabricated by the irradiation of an oxidized Si surface with swift heavy ions, nanopore etching in the SiO 2 layer, and the electrochemical deposition of nickel in the nanopores with their partial (∼50%) or complete filling. Studies of the morphology of the metal in t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2014-07, Vol.8 (4), p.805-813
Hauptverfasser:	Demyanov, S. E., Kaniukov, E. Yu, Petrov, A. V., Belonogov, E. K., Streltsov, E. A., Ivanov, D. K., Ivanova, Yu. A., Trautmann, C., Terryn, H., Petrova, M., Ustarroz, J., Sivakov, V.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry and Materials Science Materials Science Surfaces and Interfaces Thin Films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!