Statistically distributed nano-scratch testing of AlFeMnNb, AlFeMnNi, and TiN/Si3N4 thin films on silicon

For studying the damage tolerance of thin films, a novel randomly distributed nano-scratch test method was introduced and demonstrated as a promising characterization method. It is capable of more closely simulating the damage progression in abrasion, where material removal can be influenced by the...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2024-01, Vol.42 (1)
Hauptverfasser:	Beake, Ben D., Vishnyakov, Vladimir M., Goodes, Stephen R., Rahmati, Azadeh Taher
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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