Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition

Indium tin oxide (ITO) thin films were grown by Ar ion beam sputter deposition under systematic variation of ion energy, geometrical parameters, and O 2 background pressure and characterized with regard to the film thickness, growth rate, crystalline structure, surface roughness, mass density, compo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2021-05, Vol.39 (3)
Hauptverfasser: Bundesmann, Carsten, Bauer, Jens, Finzel, Annemarie, Gerlach, Jürgen W., Knolle, Wolfgang, Hellmich, Anke, Synowicki, Ron
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!