Measuring acid generation efficiency in chemically amplified resists with all three beams

A method for measuring acid generation efficiency is presented and utilized to determine the relative efficiency of four photoacid generators (PAGs) upon radiation with photon, electron, and ion beams. In this method, chemically amplified resists are prepared with varying amounts of base, coated int...

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Veröffentlicht in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 1999-11, Vol.17 (6), p.3356-3361
Hauptverfasser:	Szmanda, Charles R., Brainard, Robert L., Mackevich, Joseph F., Awaji, Akira, Tanaka, Tsutomu, Yamada, Yutaka, Bohland, John, Tedesco, Serge, Dal’Zotto, Bernard, Bruenger, Wilhelm, Torkler, Michael, Fallmann, Wolfgang, Loeschner, Hans, Kaesmaier, Rainer, Nealey, Paul M., Pawloski, Adam R.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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