Formation of alkylsiloxane self-assembled monolayers on Si3N4

The structure of alkylsiloxane self-assembled monolayers formed on HF-treated Si3N4 has been studied using x-ray photoelectron spectroscopy, high-resolution electron energy-loss spectroscopy, and contact angle analysis. It is shown that the monolayers are similar in quality to those formed on oxidiz...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 1999-03, Vol.17 (2), p.540-544
Hauptverfasser:	Sung, Myung M., Kluth, G. Jonathan, Maboudian, Roya
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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