Effect of the plasma confinement on properties of a-C:H:SiOx films grown by plasma enhanced chemical vapor deposition

The properties of SiOx doped amorphous hydrogenated carbon (a-C:H:SiOx) films greatly depend on the deposition parameters, in particular, on the ion bombardment intensity during the film growth. In this work, a magnetic field created by an external magnetic coil was used for plasma confinement and c...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2019-11, Vol.37 (6)
Hauptverfasser:	Grenadyorov, Alexander S., Solovyev, Аndrey А., Oskomov, Konstantin V., Oskirko, Vladimir O.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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