Fourier transform infrared spectroscopy of trifluoroiodomethane plasma

Fluorocarbon species (C x F y ) are commonly used in plasma etch processes. Trifluoroiodomethane (CF3I) might also be used as an etch gas, but there is a limited understanding as to how it will react. In this article, the authors examine the creation of C x F y daughter species from CF3I under diffe...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2017-11, Vol.35 (6)
Hauptverfasser:	Fagioli, Cassius J. F., Urrabazo, David, Goeckner, Matthew J.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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