Random texturing process for multicrystalline silicon solar cells using plasmaless dry etching
The authors have investigated a process for randomly texturing single- and multicrystalline Si solar cells by plasmaless dry etching with a chlorine trifluoride gas. Although the reflectance of as-textured surfaces was easily reduced to below 10% at a wavelength of 600 nm in our previous study, the...
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| Veröffentlicht in: | Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2016-09, Vol.34 (5) |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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