Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer

Nanoscale periodic patterning on insulating materials using focused-ion beam (FIB) is challenging because of charging effect, which causes pattern distortion and resolution degradation. In this paper, the authors used a charging suppression scheme using electron conducting polymer for the implementa...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2015-11, Vol.33 (6)
Hauptverfasser: Alias, Mohd Sharizal, Liao, Hsien-Yu, Ng, Tien Khee, Ooi, Boon Siew
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!