Determination and analysis of minimum dose for achieving vertical sidewall in electron-beam lithography

Prior to carrying out the proximity effect correction by optimizing the spatial distribution of dose in electron beam lithography, one first needs to determine the minimum total dose required. A conventional method typically used to determine the minimum total dose is the trial-and-error approach, w...

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Veröffentlicht in:	Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2014-11, Vol.32 (6)
Hauptverfasser:	Zhao, Xinyu, Dai, Qing, Lee, Soo-Young, Choi, Jin, Lee, Sang-Hee, Shin, In-Kyun, Jeon, Chan-Uk
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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