Fabrication of an adhesion-free transparent roll stamp for large area patterning using ultraviolet-type roller nanoimprint lithography

Roll nanoimprint technology has many advantages, including continuous fabrication of functional structures and fast pattern transfer on a large area. From the viewpoint of mass production, the hydrophobic characteristic of the nanopatterned roll stamp surface is important for minimizing defects that can be generated during the demolding process. In this study, polyvinylsilazane (PVSZ) was used for the top layer of a quartz roll stamp because the cured PVSZ is a nonsticky silicate with high mechanical properties (hardness of 416 GPa and Young's modulus of 3.27 GPa). In addition, PVSZ has good characteristics: ultraviolet curability at room temperature, high optical transparency, and excellent release properties after the hydrolysis process.Furthermore, the cured PVSZ layer after the hydrolysis process does not require any additional surface modification and can be used as an ideal mold with a low adhesion force for roll nanoimprint lithographic applications.