High-density pattern transfer via roll-to-roll ultraviolet nanoimprint lithography using replica mold

Roll-to-roll ultraviolet nanoimprint lithography (RTR UV-NIL) has attracted much attention as a high-throughput nanofabrication process. In particular, high-density nanoscale line-and-space (L&S) patterns are widely used for optical devices and printed circuits, such as wire-grid polarizers and...

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Veröffentlicht in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2012-11, Vol.30 (6)
Hauptverfasser:	Taniguchi, Jun, Yoshikawa, Hiroshi, Tazaki, Go, Zento, Toshiyuki
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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