Recent developments and design challenges in continuous roller micro- and nanoimprinting

As an emerging technology for the manufacture of micro- and nano-scale patterns, continuous imprinting; otherwise known as roll-to-roll or roller imprinting, is attracting interest from researchers around the world because of its inherent advantages of low cost, high throughput, large area patternin...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2012-01, Vol.30 (1), p.010801-010801-28
Hauptverfasser: Dumond, Jarrett J., Yee Low, Hong
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 010801-28
container_issue 1
container_start_page 010801
container_title Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
container_volume 30
creator Dumond, Jarrett J.
Yee Low, Hong
description As an emerging technology for the manufacture of micro- and nano-scale patterns, continuous imprinting; otherwise known as roll-to-roll or roller imprinting, is attracting interest from researchers around the world because of its inherent advantages of low cost, high throughput, large area patterning. This technology is an evolutionary advance on the more traditional nanoimprint lithography developed in the 1990s, which is considered a batch mode, or dis-continuous patterning approach. In recent years, a number of commercial applications have been discovered which require low cost, large area patterning, particularly displays, optical coatings and films, and biological applications such as anti-fouling surfaces and micro-fluidic devices. This review covers a variety of continuous imprinting approaches, highlights challenges, and surveys progress towards high speed production of micro- and nanoscale features for these applications and others using this platform technology.
doi_str_mv 10.1116/1.3661355
format Article
fullrecord <record><control><sourceid>scitation_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1116_1_3661355</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>scitation_primary_10_1116_1_3661355</sourcerecordid><originalsourceid>FETCH-LOGICAL-c419t-21453feed9ab1e44be8553ad1a061cabc942ebb4f68e37ce39aadb218358420e3</originalsourceid><addsrcrecordid>eNqNkE9LAzEQxYMoWKsHv8FeFbZmNn-6e_AgxapQEETBW8hmZ2tkNynJtuC3N7UFvSie5s3j94bhEXIOdAIA8gomTEpgQhyQEYiC5qWQ08Ok6RRyoAU7JicxvlNKpWBsRF6f0KAbsgY32PlVn3TMtGuSEe3SZeZNdx26JcbMps27wbq1X8cs-OSHrLcm-Pwr4bTztl8Fu2WWp-So1V3Es_0ck5f57fPsPl883j3Mbha54VANeQFcsBaxqXQNyHmNpRBMN6CpBKNrU_EC65q3skQ2NcgqrZu6gJKJkhcU2Zhc7O6mP2IM2Kr0Qa_DhwKqtpUoUPtKEnu9Y6Oxgx6sd7_Du17Uz15S_vLf-b_gjQ_foFo1LfsE0QyG4Q</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Recent developments and design challenges in continuous roller micro- and nanoimprinting</title><source>AIP Journals Complete</source><source>Alma/SFX Local Collection</source><creator>Dumond, Jarrett J. ; Yee Low, Hong</creator><creatorcontrib>Dumond, Jarrett J. ; Yee Low, Hong</creatorcontrib><description>As an emerging technology for the manufacture of micro- and nano-scale patterns, continuous imprinting; otherwise known as roll-to-roll or roller imprinting, is attracting interest from researchers around the world because of its inherent advantages of low cost, high throughput, large area patterning. This technology is an evolutionary advance on the more traditional nanoimprint lithography developed in the 1990s, which is considered a batch mode, or dis-continuous patterning approach. In recent years, a number of commercial applications have been discovered which require low cost, large area patterning, particularly displays, optical coatings and films, and biological applications such as anti-fouling surfaces and micro-fluidic devices. This review covers a variety of continuous imprinting approaches, highlights challenges, and surveys progress towards high speed production of micro- and nanoscale features for these applications and others using this platform technology.</description><identifier>ISSN: 1071-1023</identifier><identifier>ISSN: 2166-2746</identifier><identifier>EISSN: 1520-8567</identifier><identifier>EISSN: 2166-2754</identifier><identifier>DOI: 10.1116/1.3661355</identifier><identifier>CODEN: JVTBD9</identifier><language>eng</language><publisher>American Vacuum Society</publisher><ispartof>Journal of vacuum science &amp; technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2012-01, Vol.30 (1), p.010801-010801-28</ispartof><rights>American Vacuum Society</rights><rights>2012 American Vacuum Society</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c419t-21453feed9ab1e44be8553ad1a061cabc942ebb4f68e37ce39aadb218358420e3</citedby><cites>FETCH-LOGICAL-c419t-21453feed9ab1e44be8553ad1a061cabc942ebb4f68e37ce39aadb218358420e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,794,4512,27924,27925</link.rule.ids></links><search><creatorcontrib>Dumond, Jarrett J.</creatorcontrib><creatorcontrib>Yee Low, Hong</creatorcontrib><title>Recent developments and design challenges in continuous roller micro- and nanoimprinting</title><title>Journal of vacuum science &amp; technology. B, Microelectronics and nanometer structures processing, measurement and phenomena</title><description>As an emerging technology for the manufacture of micro- and nano-scale patterns, continuous imprinting; otherwise known as roll-to-roll or roller imprinting, is attracting interest from researchers around the world because of its inherent advantages of low cost, high throughput, large area patterning. This technology is an evolutionary advance on the more traditional nanoimprint lithography developed in the 1990s, which is considered a batch mode, or dis-continuous patterning approach. In recent years, a number of commercial applications have been discovered which require low cost, large area patterning, particularly displays, optical coatings and films, and biological applications such as anti-fouling surfaces and micro-fluidic devices. This review covers a variety of continuous imprinting approaches, highlights challenges, and surveys progress towards high speed production of micro- and nanoscale features for these applications and others using this platform technology.</description><issn>1071-1023</issn><issn>2166-2746</issn><issn>1520-8567</issn><issn>2166-2754</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqNkE9LAzEQxYMoWKsHv8FeFbZmNn-6e_AgxapQEETBW8hmZ2tkNynJtuC3N7UFvSie5s3j94bhEXIOdAIA8gomTEpgQhyQEYiC5qWQ08Ok6RRyoAU7JicxvlNKpWBsRF6f0KAbsgY32PlVn3TMtGuSEe3SZeZNdx26JcbMps27wbq1X8cs-OSHrLcm-Pwr4bTztl8Fu2WWp-So1V3Es_0ck5f57fPsPl883j3Mbha54VANeQFcsBaxqXQNyHmNpRBMN6CpBKNrU_EC65q3skQ2NcgqrZu6gJKJkhcU2Zhc7O6mP2IM2Kr0Qa_DhwKqtpUoUPtKEnu9Y6Oxgx6sd7_Du17Uz15S_vLf-b_gjQ_foFo1LfsE0QyG4Q</recordid><startdate>20120101</startdate><enddate>20120101</enddate><creator>Dumond, Jarrett J.</creator><creator>Yee Low, Hong</creator><general>American Vacuum Society</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20120101</creationdate><title>Recent developments and design challenges in continuous roller micro- and nanoimprinting</title><author>Dumond, Jarrett J. ; Yee Low, Hong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c419t-21453feed9ab1e44be8553ad1a061cabc942ebb4f68e37ce39aadb218358420e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Dumond, Jarrett J.</creatorcontrib><creatorcontrib>Yee Low, Hong</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of vacuum science &amp; technology. B, Microelectronics and nanometer structures processing, measurement and phenomena</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Dumond, Jarrett J.</au><au>Yee Low, Hong</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Recent developments and design challenges in continuous roller micro- and nanoimprinting</atitle><jtitle>Journal of vacuum science &amp; technology. B, Microelectronics and nanometer structures processing, measurement and phenomena</jtitle><date>2012-01-01</date><risdate>2012</risdate><volume>30</volume><issue>1</issue><spage>010801</spage><epage>010801-28</epage><pages>010801-010801-28</pages><issn>1071-1023</issn><issn>2166-2746</issn><eissn>1520-8567</eissn><eissn>2166-2754</eissn><coden>JVTBD9</coden><abstract>As an emerging technology for the manufacture of micro- and nano-scale patterns, continuous imprinting; otherwise known as roll-to-roll or roller imprinting, is attracting interest from researchers around the world because of its inherent advantages of low cost, high throughput, large area patterning. This technology is an evolutionary advance on the more traditional nanoimprint lithography developed in the 1990s, which is considered a batch mode, or dis-continuous patterning approach. In recent years, a number of commercial applications have been discovered which require low cost, large area patterning, particularly displays, optical coatings and films, and biological applications such as anti-fouling surfaces and micro-fluidic devices. This review covers a variety of continuous imprinting approaches, highlights challenges, and surveys progress towards high speed production of micro- and nanoscale features for these applications and others using this platform technology.</abstract><pub>American Vacuum Society</pub><doi>10.1116/1.3661355</doi><tpages>28</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1071-1023
ispartof Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2012-01, Vol.30 (1), p.010801-010801-28
issn 1071-1023
2166-2746
1520-8567
2166-2754
language eng
recordid cdi_crossref_primary_10_1116_1_3661355
source AIP Journals Complete; Alma/SFX Local Collection
title Recent developments and design challenges in continuous roller micro- and nanoimprinting
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T20%3A37%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-scitation_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Recent%20developments%20and%20design%20challenges%20in%20continuous%20roller%20micro-%20and%20nanoimprinting&rft.jtitle=Journal%20of%20vacuum%20science%20&%20technology.%20B,%20Microelectronics%20and%20nanometer%20structures%20processing,%20measurement%20and%20phenomena&rft.au=Dumond,%20Jarrett%20J.&rft.date=2012-01-01&rft.volume=30&rft.issue=1&rft.spage=010801&rft.epage=010801-28&rft.pages=010801-010801-28&rft.issn=1071-1023&rft.eissn=1520-8567&rft.coden=JVTBD9&rft_id=info:doi/10.1116/1.3661355&rft_dat=%3Cscitation_cross%3Escitation_primary_10_1116_1_3661355%3C/scitation_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true