Effect of UV wavelength on the hardening process of porogen-containing and porogen-free ultralow- k plasma-enhanced chemical vapor deposition dielectrics

The effect of narrow-band 172 nm and broad-band > 200   nm UV sources in the new curing scheme of the plasma-enhanced chemical vapor deposition (PECVD) dielectrics is studied. The new curing scheme is based on porogen removal (organic sacrificial phase introduced to generate open porosity) from P...

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Veröffentlicht in:	Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2011-05, Vol.29 (3), p.032201-032201-9
Hauptverfasser:	Urbanowicz, Adam M., Vanstreels, Kris, Verdonck, Patrick, Van Besien, Els, Christos, Trompoukis, Shamiryan, Denis, De Gendt, Stefan, Baklanov, Mikhail R.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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