Review of electrical characterization of ultra-shallow junctions with micro four-point probes
Electrical characterization of ultra-shallow junctions, relying on advanced implant and anneal processes, has received much attention in the past few years since conventional characterization methods fail. With continued scaling of semiconductor devices, the problems associated with conventional tec...
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| Veröffentlicht in: | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2010-01, Vol.28 (1), p.C1C27-C1C33 |
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| container_end_page | C1C33 |
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| container_title | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena |
| container_volume | 28 |
| creator | Petersen, Dirch H. Hansen, Ole Hansen, Torben M. Bøggild, Peter Lin, Rong Kjær, Daniel Nielsen, Peter F. Clarysse, Trudo Vandervorst, Wilfried Rosseel, Erik Bennett, Nick S. Cowern, Nick E. B. |
| description | Electrical characterization of ultra-shallow junctions, relying on advanced implant and anneal processes, has received much attention in the past few years since conventional characterization methods fail. With continued scaling of semiconductor devices, the problems associated with conventional techniques will become even more evident. In several recent studies micro four-point probe (M4PP) has been demonstrated as a reliable high precision metrology method for both sheet resistance and Hall effect measurements of ultra-shallow implants and has revealed a promising potential for carrier profiling. |
| doi_str_mv | 10.1116/1.3224898 |
| format | Article |
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| ispartof | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2010-01, Vol.28 (1), p.C1C27-C1C33 |
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| language | eng |
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| source | Alma/SFX Local Collection; AIP Journals (American Institute of Physics) |
| title | Review of electrical characterization of ultra-shallow junctions with micro four-point probes |
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