High- Q micromachined three-dimensional integrated inductors for high-frequency applications

Three-dimensional micromachined inductors are fabricated on high-resistivity ( 10 k Ω cm ) and low-resistivity ( 10 Ω cm ) Si substrates using a stressed metal technology. On high-resistivity Si substrate with low- k dielectric material (SU-8™), this technology achieves a quality factor Q of 75 for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2007-01, Vol.25 (1), p.264-270
Hauptverfasser:	Weon, Dae-Hee, Jeon, Jong-Hyeok, Mohammadi, Saeed
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!