Photomask plasma etching: A review
Photomask plasma etching was thoroughly reviewed over wide topics including history, equipment, etchant, absorbers, phase shifters, thermodynamics, and kinetics. Plasma etch obtained industrial applications for photomask fabrication in the 1990s and presently is a critical fabrication step for the “...
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| Veröffentlicht in: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2006-01, Vol.24 (1), p.1-15 |
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| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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