Thermal reaction of polycrystalline AlN with XeF2

Detailed studies on the thermal reaction behavior of polycrystalline aluminum nitride (AlN) with effusive xenon difluoride (XeF2) have been carried out over the sample temperature (Ts) range from 300to920K using molecular beam mass spectrometry combined with a time-of-flight technique and ex situ su...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2005-11, Vol.23 (6), p.1647-1656
Hauptverfasser:	Watanabe, Morimichi, Mori, Yukimasa, Ishikawa, Takahiro, Sakai, Hiroaki, Iida, Takashi, Akiyama, Keijiro, Narita, Shogo, Sawabe, Kyoichi, Shobatake, Kosuke
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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