Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles

ZnO atomic layer deposition (ALD) was achieved using sequential exposures of Zn(CH2CH3)2 and H2O on ZrO2 and BaTiO3 particles at 450K. The surface chemistry of ZnO ALD was monitored in vacuum using Fourier transform infrared spectroscopy. The BaTiO3 and ZrO2 particles initially displayed vibrational...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2005-01, Vol.23 (1), p.118-125
Hauptverfasser:	Ferguson, J. D., Weimer, A. W., George, S. M.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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