Development of electromagnetic lenses for multielectron beam lithography system

High-throughput electron-beam (EB) lithography systems require high current. However, beam blur increases because of the individual Coulomb interaction among the electron beams. Isolating the electron beam into 4–16 perfectly independent beamlets is effective. As for the electromagnetic lens, many o...

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Veröffentlicht in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2002-11, Vol.20 (6), p.2726-2729
Hauptverfasser:	Haraguchi, T., Sakazaki, T., Hamaguchi, S., Yasuda, H.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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